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Ultra-high resolution of 512×512 (262144) phase points, achieving high-precision wavefront measurement in the 900nm to 1200nm band, which can be used for optical system aberration measurement, optical system calibration, material internal lattice distribution measurement, metasurface, superlens wavefront measurement, etc.

Specially developed for wavefront analysis in high-speed industrial, defense and scientific research scenarios such as flying shots and flow fields, it has an ultra-high resolution of 420×420 (176400) phase points, a wide spectrum response of 400-1100nm, and 107 frames of high-speed sampling, providing an ideal wavefront sensing measurement tool for wafer surface roughness detection, silicon-based and glass substrate micro-morphology measurement, aerodynamic optics, high-speed flow field, gas plasma density measurement, etc.

​Designed to assist scientific research and high-precision industrial scenarios, higher resolution can provide more detailed information in wavefront detection, ultra-high resolution of 512×512 (262144) phase points, 400-1100nm wide spectrum response, 10 frames of full-resolution real-time 3D result display, providing ideal wavefront sensing measurement tools for laser beam wavefront detection, adaptive optics, plane surface measurement, optical system calibration, optical window detection, optical spherical surface measurement, surface roughness detection, surface micro-contour, etc.

Developed specifically for convenient interferometric measurement in industry, scientific research, and national defense. High resolution of 300×300 (90,000) phase points, 400-1100nm wide spectral response, 10 frames of full-resolution real-time 3D result display, providing an ideal wavefront sensing measurement tool for laser beam wavefront detection, adaptive optics, optical system calibration, optical window detection, optical plane surface shape, spherical surface shape measurement, surface roughness, surface micro-contour detection, etc.