Bojiong (Shanghai) Precision Machinery Technology Co., Ltd
Bojiong (Shanghai) Precision Machinery Technology Co., Ltd
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FIS4 NIR Wavefront Sensor
  • FIS4 NIR Wavefront SensorFIS4 NIR Wavefront Sensor

FIS4 NIR Wavefront Sensor

BOJIONG Optoelectronics, driven by an unwavering dedication to innovation in FIS4 NIR Wavefront sensor technology, has solidified its position as a pioneering force in the industry. Our state-of-the-art sensors are meticulously engineered to deliver unparalleled precision in optical performance measurement, serving a diverse spectrum of applications across sectors such as optical manufacturing, aerospace, biomedical research, and energy exploration.

Our FIS4 NIR Wavefront sensors are expertly crafted to meet the exacting demands of high-precision optical analysis, providing our clientele with a dependable instrument to ensure the superior quality of their products and operational processes.  By integrating these sensors into their workflows, our customers can anticipate a substantial enhancement in both product excellence and manufacturing efficiency.

The exceptional high resolution and extensive wavelength range of the BOJIONG FIS4 NIR Wavefront sensor render it an optimal instrument for both scientific research and industrial deployment, particularly in contexts demanding meticulous measurement and rigorous analysis.  This sensor is adept at performing high-precision wavefront measurements within the 900nm to 1200nm wavelength spectrum, boasting a resolution of 512x512 pixels—totaling an impressive 262,144 phase points.  Its design thoughtfully incorporates robustness against vibration and ensures stability for real-world applications, enabling high-fidelity measurements without necessitating elaborate environmental control mechanisms.  This inherent resilience significantly streamlines operational procedures and markedly enhances overall measurement efficiency.

 

Specification:

 

Light source type

Continuous laser,Pulse laser,LED, halogen lamp, and other broadband light sources

Wavelength range

900nm~1200nm 

Target size

13.3mm×13.3mm

Spatial resolution

26μm

Phase output resolution

512×512

Absolute accuracy

20nmRMS

Phase resolution

≤2nmRMS

Dynamic range

≥260μm

Sampling rate

40fps

Real-time processing speed

5Hz(At full resolution)

Interface type

USB3.0

Dimension

70mm×46.5mm×68.5mm

Weight

about240g

Refrigeration method

none

 

 

Feature

 

 

 

◆Wide spectrum 900nm~1200nm band

◆Single-path light self-interference, no reference light required

◆100% domestically developed

◆2nm RMS high phase resolution

◆Large dynamic range up to 260μm

◆Extremely strong vibration resistance, no need for optical vibration isolation

◆With laser interference fringe suppression design

◆Support collimated beams and large NA converging beams

 

 

 Application

 

This BOJIONG FIS4 NIR Wavefront sensor used in optical system aberration measurement, optical system calibration, material internal lattice distribution measurement, hypersurface, hyperlens wave front measurement

 

 

Example of aberration measurement of optical system

Sample measurement of lattice distribution inside a material

Optical system calibration measurement examples

Example of metasurface wavefront measurement

 

Example of hyperlens wavefront measurement

 

 

 

 

 

Details

 

Bojiong FIS4 NIR wavefront sensor is developed by a team of professors from Zhejiang University and Nanyang Technological University, Singapore. FIS4 NIR combines patented random coded four-wave diffraction technology with an infrared camera to interfere at the rear image plane position. It has low requirements for light source coherence and does not require phase shifting. Ordinary imaging systems can achieve interferometric measurement. It has ultra-high vibration resistance and ultra-high stability, and can achieve nm-level precision measurement without vibration isolation. The ultra-high resolution of 512×512 (262144) phase points achieves high-precision wavefront measurement in the 900nm to 1200nm band, which can be used for optical system aberration measurement, optical system calibration, material internal lattice distribution measurement, metasurface, superlens wavefront measurement, etc.




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