Near-Infrared Wavefront Analyzer

The Near-Infrared Wavefront Analyzer that combines the patented technology of random coded four-wave diffraction with an infrared camera allows for interference measurement to be conducted by ordinary imaging systems. It boasts an exceptionally high level of vibration resistance and stability, enabling nanometer-level precision measurement without the need for vibration isolation. It is suitable for measuring the internal lattice distribution of materials, as well as for wavefront measurements of metasurfaces and hyperlenses.

Item Specification:

Feature Of BOJIONG Near-Infrared Wavefront Analyzer

◆Broad spectrum 900nm~1200nm band

◆2nm RMS high phase resolution

◆Ultra-high resolution of 512×512 (262144) phase points

◆Single-channel light self-interference, no reference light required

◆Large dynamic range up to 270μm

◆Extremely strong anti-vibration performance, no need for optical vibration isolation

◆Just like imaging, easy and fast optical path construction

◆Supports collimated beams and large NA converged beams

Application Of BOJIONG Near-Infrared Wavefront Analyzer

This BOJIONG Near-Infrared Wavefront Analyzer used in optical system aberration measurement, optical system calibration, material internal lattice distribution measurement, hypersurface, hyperlens wave front measurement

BOJIONG Near-Infrared Wavefront Analyzer Details

BOJIONG Near-Infrared Wavefront Analyzer developed by a team of professors from Zhejiang University and Nanyang Technological University of Singapore, with domestic patented technology, it combines diffraction and interference to achieve a common four-wave transverse shear interference, with superior detection sensitivity and anti-vibration performance, and can realize real-time and high-speed dynamic interferometry without vibration isolation. The real-time measurement shows a frame rate of more than 10 frames. At the same time, the FIS4 sensor has an ultra-high phase resolution of 512×512 (260,000 phase points), the measurement band covers 200nm~15μm, the measurement sensitivity reaches 2nm, and the measurement repeatability is better than 1/1000λ (RMS). It can be used for laser beam quality analysis, plasma flow field detection, real-time measurement of high-speed flow field distribution, image quality evaluation of optical system, microscopic profile measurement and quantitative phase imaging of biological cells.