FIS4 near-infrared wavefront sensor 900-1200nm

FIS4 Near-Infrared wavefront sensor 900-1200nm

The Bojiong FIS4 Near-Infrared wavefront sensor 900-1200nm is specifically designed for precision measurement in the 900–1700nm wavelength band. It adopts deeply optimized four-wave lateral shearing interferometry technology and an infrared-enhanced detection module, achieving an ultra-high spatial resolution of 512×512 and a phase sensitivity of 2nm RMS within the near-infrared spectral range. The sensor features a large dynamic range of ≥260μm, enabling accurate analysis of strong aberrations and steep wavefronts while effectively suppressing laser speckle interference. Equipped with full-band anti-reflective coating and a common-path anti-vibration structure, it can perform stable and highly repeatable measurements without vibration isolation in scenarios such as laser processing, optical system integration testing, and semiconductor metrology, providing reliable data support for infrared optical design and manufacturing.

Bojiong FIS4 Near-Infrared wavefront sensor 900-1200nm Introduction

The Bojiong FIS4 Near-Infrared wavefront sensor 900-1200nm is our company's new generation of high-precision optical inspection equipment, featuring excellent vibration resistance and real-time wavefront measurement capabilities. The FIS4 Near-Infrared wavefront sensor 900-1200nm to the ISO 9001 quality management system and is certified by the China Institute of Metrology (NIM). It comes with a one-year warranty. The FIS4 Near-Infrared wavefront sensor 900-1200nm is plug-and-play, easy to operate, and low-maintenance, effectively improving the inspection efficiency and reliability of optical systems.

Bojiong FIS4 Near-Infrared wavefront sensor 900-1200nm Parameter (Specification)

Bojiong FIS4 Near-Infrared wavefront sensor 900-1200nm Feature And Application 

Since 2006, Professor Yang Yongying's team at Zhejiang University has successfully launched the wide-spectrum FIS4 series wavefront sensor based on common-path interferometry design and real-time wavefront reconstruction algorithms after 17 years of dedicated research and development. This product has the following outstanding features:

·Strong anti-vibration and vibration isolation-free: Real-time wavefront detection can be achieved in complex environments without the need for a vibration isolation platform;

·High-sensitivity measurement: Wavefront sensitivity up to 2nm RMS, enabling accurate capture of tiny phase changes;

·Single optical path plug-and-play: Original single optical path design without reference light, allowing immediate use upon power-on and convenient operation;

·Compact, lightweight and portable: Only the size of a fist, facilitating integration and field use.

The FIS4 Near-Infrared wavefront sensor 900-1200nm is designed for high-end optical metrology in industrial inspection, scientific research, and defense applications. With a high resolution of 512×512 (262,144) phase points, they enable high-precision wavefront measurements in the 900–1200 nm range and support real-time 3D display of results at full resolution at 10 frames per second. The FIS4 Near-Infrared wavefront sensor 900-1200nm can be used for aberration measurement of optical systems, optical system calibration, measurement of internal lattice distribution of materials, wavefront measurement of metasurfaces and metalenses, etc.

Bojiong FIS4 Near-Infrared wavefront sensor 900-1200nm  Application

Bojiong FIS4 Near-Infrared wavefront sensor 900-1200nm Details

The FIS4 Near-Infrared wavefront sensor 900-1200nm utilizes patented random-coded four-wave diffraction technology , achieving self-interference of the measured wavefront using a single light path. Interference occurs at the rear image plane. This technology significantly reduces the requirement for light source coherence, eliminating the need for phase shifters and enabling high-precision interferometry measurements with standard imaging systems.The product offers excellent vibration resistance and ultra-high stability, enabling nanometer-level wavefront measurement without the need for an isolation platform. Compared to traditional Hartmann sensors based on microlens arrays, the FIS4 Near-Infrared wavefront sensor 900-1200nm excels in several key performance indicators: higher phase point resolution, wider operating band adaptability, and greater dynamic range. It also offers superior cost-performance, providing a reliable solution for a wide range of precision optical inspection scenarios.

Fig.1.Phase imaging principle based on four-wave lateral shearing interference using randomly coded hybrid grating (REHG)

Fig.2.Least square wavefront reconstruction from four-wave lateral shearing interferogram

The FIS4 wavefront sensor has become a powerful and widely used tool in scientific research and industry due to its advantages such as compact structure, strong stability, high temporal resolution, and good compatibility with existing microscopy systems. Initially, this sensor was mainly used for detection tasks in traditional optical workshops, including optical component quality evaluation, laser beam analysis, and adaptive optical system correction. Subsequently, its application scenarios have gradually expanded to multiple cutting-edge fields such as biomedical imaging, nanoparticle positioning, metasurface characterization, and temperature gradient measurement.

The compact mechanical design of the FIS4 wavefront sensor enables it to be easily integrated into various existing microscopy platforms, while its excellent robustness ensures that high interferometric measurement accuracy can still be maintained even in strong vibration environments.Meanwhile, the device supports single-exposure measurement, which can effectively capture high-speed dynamic processes and is suitable for real-time observation needs. In biomedical research, FIS4 has successfully achieved label-free, high-resolution, real-time imaging of various living cells, such as COS-7, HT1080, RPE, CHO, HEK cells and neurons, providing an important tool for cell dynamics research.

In addition, the FIS4 wavefront sensor is also widely used in phase retardation imaging, revealing anisotropic biological tissues and subcellular structures, such as Collagen fibres and cytoskeletons, through high-contrast images. This technology is further extended to phase imaging in X-ray, mid-wave infrared (MWIR) and long-wave infrared (LWIR) bands, showing its wide potential in interdisciplinary applications.Recently, FIS4 has also been widely used in the characterization studies of metasurfaces and two-dimensional materials, which fully demonstrates its practical value and prospects in the fields of modern optics and materials science.