FIS4 ultraviolet wavefront sensor 200-400nm

FIS4 ultraviolet wavefront sensor 200-400nm

The Bojiong FIS4 ultraviolet wavefront sensor 200-400nm is a specialized instrument designed for high-precision measurements in the 200–400nm UV and deep UV bands. Utilizing a UV-enhanced detection module and UV-resistant optics, the sensor maintains an ultra-high 512×512 spatial resolution and better than 2nm RMS phase measurement accuracy even at short wavelengths. Utilizing a proprietary randomly coded grating and high-performance reconstruction algorithm, the FIS4 ultraviolet wavefront sensor 200-400nm  offers superior interference immunity, precise measurement performance, and broad industrial compatibility, enabling stable application in a variety of complex scenarios.

Bojiong FIS4 ultraviolet wavefront sensor 200-400nm Introduction

The Bojiong FIS4 ultraviolet wavefront sensor 200-400nm is our company's new generation of high-precision optical inspection equipment. It complies with ISO 9001 quality management system standards and is certified by the China Institute of Metrology (NIM). It comes with a one-year quality guarantee. The FIS4 ultraviolet wavefront sensor 200-400nm  utilizes a unique UV common-path interferometer structure and high-dynamic optical design, resulting in excellent vibration resistance and stability. Without additional vibration isolation measures, it delivers highly repeatable and reliable measurements in demanding applications such as lithography machine optical calibration, UV micromachining, and biochemical testing. Plug-and-play operation ensures easy operation and maintenance.

Bojiong FIS4 ultraviolet wavefront sensor 200-400nm Parameter (Specification)

Bojiong FIS4 ultraviolet wavefront sensor 200-400nm Feature And Application

Since 2006, Professor Yang Yongying's team at Zhejiang University has dedicated 17 years to the development of the wide-spectrum FIS4 series wavefront sensors, based on a common-path interferometry architecture and real-time wavefront reconstruction algorithms. The sensors offer the following key features:

·No optical vibration isolation required, ensuring strong environmental adaptability

·Up to 2nm RMS phase resolution for exceptional accuracy

·Single optical path design eliminates the need for reference light, enabling plug-and-play operation

·Compact design for easy integration and deployment

The FIS4 ultraviolet wavefront sensor 200-400nm is designed for applications in precision optical processing, defense, and semiconductor manufacturing. With a high resolution of 512×512 (262,144) phase points, a wide spectral response from 200–400nm, and 10-frame full-resolution real-time 3D display, it provides a highly reliable wavefront sensing solution for applications such as optical system aberration measurement, optical calibration, wafer surface inspection, and optical spherical surface analysis.

Bojiong FIS4 ultraviolet wavefront sensor 200-400nm Application

Bojiong FIS4 ultraviolet wavefront sensor 200-400nm Details

The FIS4 ultraviolet wavefront sensor 200-400nm is based on the patented technology of randomly encoded four-wave diffraction, enabling true single-beam self-interference measurement. This technology significantly simplifies the optical path structure and supports not only laser light sources but also wide-spectrum light sources such as LEDs and halogen lamps. FIS4 ultraviolet wavefront sensor 200-400nm  has excellent resistance to environmental interference and can achieve stable measurement with nanoscale precision in ordinary experimental environments without vibration isolation devices. Compared with Hartmann sensors based on microlens arrays, the FIS4 ultraviolet wavefront sensor 200-400nm  achieves significant improvements in multiple performance dimensions: higher phase point resolution (up to 262,144 points), wider spectral adaptation range, larger measurement dynamic range, and obvious advantages in comprehensive cost performance.

Fig.1.Phase imaging principle based on four-wave lateral shearing interference using randomly coded hybrid grating (REHG)

Fig.2.Least square wavefront reconstruction from four-wave lateral shearing interferogram

The FIS4 wavefront sensor has emerged as a powerful and highly versatile precision tool in scientific research and industrial inspection, owing to its compact structure, high environmental robustness, excellent temporal resolution, and strong compatibility with existing microscopy systems. Initially, it was primarily utilized in traditional optical workshop testing scenarios, including optical element surface profiling, laser beam quality evaluation, and adaptive optics system correction. Today, its application scope has expanded significantly, encompassing diverse cutting-edge fields such as biomedical imaging, nanoparticle localization, metasurface characterization, and even temperature gradient measurement.

The FIS4 wavefront sensor features a highly integrated design, enabling easy integration with various microscopy platforms for rapid deployment.Its excellent anti-vibration performance ensures stable interferometric measurement accuracy and repeatability even in harsh environments. The device supports single-exposure wavefront acquisition, reliably capturing rapid dynamic processes for transient phenomenon research. In biomedical applications, FIS4 has successfully enabled label-free, high-resolution real-time imaging of various living cells—including COS-7, HT1080, RPE, CHO, HEK, and neuron cells—providing a powerful tool for cell dynamics studies.

In addition, the FIS4 wavefront sensor supports phase retardation imaging, which can generate high-contrast images of anisotropic biological tissues and subcellular structures, such as collagen fibers and cytoskeletal networks.This technology is not limited to the visible light band but has been extended to phase imaging in the X-ray, mid-wave infrared (MWIR), and long-wave infrared (LWIR) regions, demonstrating its wide adaptability in multi-spectral and interdisciplinary research. In recent years,    FIS4 wavefront sensor has also found important applications in the research of new materials, such as metasurface modulation and characterization of the optical properties of two-dimensional materials, fully reflecting its diverse values and potential in the fields of advanced optics and materials science.