At the heart of the FIS4 UV wavefront sensor lies BOJIONG’s groundbreaking randomized coding four-wave diffraction technology. This pioneering technology enables interference at the back focal plane even with minimal light source coherence, significantly reducing constraints on light source coherence and effectively eliminating the requirement for phase shifting. Integrated with an advanced ultraviolet imaging system, the FIS4 UV wavefront sensor offers real-time wavefront measurement capabilities, exhibiting exceptional vibration resistance and robustness. Impressively, it achieves nanometer-scale precision even without vibration isolation systems. This capability opens up new possibilities for high-precision measurements in diverse and demanding environments. BOJIONG Optoelectronics is set to revolutionize optical performance measurement and analysis, guiding the industry towards an unprecedented era of precision and efficiency. By setting new benchmarks for accuracy and operational ease, the FIS4 UV wavefront sensor empowers researchers and industries to push the boundaries of optical innovation.
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Light source type |
Continuous laser ， Pulse laser ， LED, halogen lamp, and other broadband light sources |
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Wavelength range |
200nm~400nm |
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Target size |
13.3mm ×13.3mm |
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Spatial resolution |
26 μ m |
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Phase output resolution |
512×512 |
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Absolute accuracy |
10nmRMS |
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Phase resolution |
≤ 2nmRMS |
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Dynamic range |
≥90μ m |
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Sampling rate |
32fps |
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Real-time processing speed |
5Hz （ At full resolution ） |
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Interface type |
USB3.0 |
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Dimension |
70mm ×46.5mm ×68.5mm |
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Weight |
about240g |
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Refrigeration method |
none |
◆ UV spectrum 200nm~400nm band
◆ 2nm RMS high phase resolution
◆ 100% domestically developed
◆ Single-path light self-interference, no reference light required
◆ Extremely strong vibration resistance, no need for optical vibration isolation
◆ With laser interference fringe suppression design
◆ Support collimated beams, high NA non-collimated beams
This BOJIONG FIS4 UV wavefront sensor used for optical system aberration measurement, optical system calibration, flat (wafer) surface shape measurement, optical spherical surface shape measurement, etc.
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Laser beam wavefront detection |
Wavefront detection response of adaptive optics Zernike mode |
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Example of aberration measurement of optical system
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Optical system calibration measurement examples
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Example of wafer surface roughness measurement
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Micro etching morphology measurement - defect sample 1 # -114 lines |
The Bojiong FIS4 UV wavefront sensor was developed by a team of professors from Zhejiang University and Nanyang Technological University, Singapore. It has an ultra-high resolution of 512 × 512 (262144) phase points, and can achieve high-precision wavefront measurement in the 200nm to 400nm band. It can be used for optical system aberration measurement, optical system calibration, plane (wafer) surface measurement, optical spherical surface measurement, etc.
FIS4 UV combines the patented random coded four-wave diffraction technology with the UV camera, and interferes at the rear image plane position. It has low requirements for light source coherence and does not require phase shifting. It can achieve real-time wavefront measurement with the UV imaging system. It has ultra-high vibration resistance and ultra-high stability, and can achieve nm-level precision measurement without vibration isolation.
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