The BOJIONG UV wavefront sensor 200-450 nm integrates patented random coding four-wave diffraction technology with an ultraviolet camera to perform interference at the rear image plane, necessitating low coherence from the light source and eliminating the need for phase shifting. Utilizing the ultraviolet imaging system, this sensor enables real-time wavefront measurement with exceptional vibration resistance and stability, achieving nanometer-level precision without the need for vibration isolation.
Product name |
UV wavefront sensor 200-450 nm |
Wavelength range |
200nm~450nm |
Target size |
13.3mm×13.3mm |
Spatial resolution |
26μm |
Sampling resolution |
512×512(262144pixel) |
Phase resolution |
<2nmRMS |
Absolute accuracy |
10nmRMS |
Dynamic range |
90μm(256λ) |
Sampling rate |
32fps |
Real-time processing speed |
10Hz(Full resolution) |
Interface type |
USB3.0 |
Dimension |
70mm×46.5mm×68.5mm |
Weight |
about 240g |
◆UV spectrum 200nm~450nm band
◆Ultra-high resolution of 512×512 (262144) phase points
◆Single-channel light self-interference, no reference light required
◆2nm RMS high phase resolution
◆Extremely strong anti-vibration performance, no need for optical vibration isolation
◆Just like imaging, easy and fast optical path construction
◆Supports collimated beams and high NA non-collimated beams
This BOJIONG Ultraviolet Four-wave Interferometric Sensor used for optical system aberration measurement, optical system calibration, flat (wafer) surface shape measurement, optical spherical surface shape measurement, etc.
Laser beam wavefront detection |
Wavefront detection response of adaptive optics Zernike mode |
Example of aberration measurement of optical system |
Optical system calibration measurement examples |
Example of wafer surface roughness measurement |
Micro etching morphology measurement - defect sample 1 # -114 lines |
The BOJIONG UV wavefront sensor 200-450 nm, developed by a team of professors from Zhejiang University and Nanyang Technological University in Singapore, utilizes domestic patented technology that combines diffraction and interference to achieve four-wave transverse shear interference. This sensor boasts excellent detection sensitivity and anti-vibration performance, enabling real-time and high-speed dynamic interferometry without the need for vibration isolation, with a frame rate of over 10 frames per second. The FIS4 sensor offers ultra-high phase resolution of 512×512 (260,000 phase points), with a measurement range spanning from 200nm to 15μm, a measurement sensitivity of 2nm, and a measurement repeatability better than 1/1000λ (RMS). It is applicable for laser beam quality analysis, plasma flow field detection, real-time measurement of high-speed flow field distribution, image quality evaluation of optical systems, microscopic profile measurement, and quantitative phase imaging of biological cells.
Address
No. 578 Yingkou Road, Yangpu District, Shanghai, China
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